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ISO7820FDW.B Datasheet(PDF) 22 Page - Texas Instruments

Part # ISO7820FDW.B
Description  ISO7820x High-Performance, 8000 VPK Reinforced Dual Channel Digital Isolator
PDF  37 Pages
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Manufacturer  TI2 [Texas Instruments]
Direct Link  https://www.ti.com
Logo TI2 - Texas Instruments

ISO7820FDW.B Datasheet(HTML) 22 Page - Texas Instruments

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GND1
GND2
INB
OUTB
16
15
14
13
12
11
10
9
1
2
3
4
5
6
7
8
GND2
NC
NC
OUTA
GND1
OUTB
VCC1
INA
VCC2
INB
GND1
NC
NC
GND2
NC
NC
GND1
GND2
GND2
VCC2
0.1 P F
VCC1
GND1
0.1 P F
ISO7820
16
15
14
13
12
11
10
9
1
2
3
4
5
6
7
8
GND2
NC
NC
INA
GND1
OUTB
VCC1
OUTA
VCC2
INB
GND1
NC
NC
GND2
NC
NC
OUTA
INA
22
ISO7820, ISO7820F
SLLSEP0A – JULY 2015 – REVISED MARCH 2016
www.ti.com
Product Folder Links: ISO7820 ISO7820F
Submit Documentation Feedback
Copyright © 2015–2016, Texas Instruments Incorporated
9.2.2 Detailed Design Procedure
Unlike optocouplers, which need external components to improve performance, provide bias, or limit current,
ISO7820 only needs two external bypass capacitors to operate.
Figure 17. Typical ISO7820 Circuit Hook-up
9.2.2.1 Electromagnetic Compatibility (EMC) Considerations
Many applications in harsh industrial environment are sensitive to disturbances such as electrostatic discharge
(ESD), electrical fast transient (EFT), surge and electromagnetic emissions. These electromagnetic disturbances
are regulated by international standards such as IEC 61000-4-x and CISPR 22. Although system-level
performance and reliability depends, to a large extent, on the application board design and layout, the ISO7820
incorporate many chip-level design improvements for overall system robustness. Some of these improvements
include:
•
Robust ESD protection for input and output signal pins and inter-chip bond pads.
•
Low-resistance connectivity of ESD cells to supply and ground pins.
•
Enhanced performance of high voltage isolation capacitor for better tolerance of ESD, EFT and surge events.
•
Bigger on-chip decoupling capacitors to bypass undesirable high energy signals through a low impedance
path.
•
PMOS and NMOS devices isolated from each other by using guard rings to avoid triggering of parasitic
SCRs.
•
Reduced common mode currents across the isolation barrier by ensuring purely differential internal operation.



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