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AN2386 Datasheet(PDF) 20 Page - STMicroelectronics |
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AN2386 Datasheet(HTML) 20 Page - STMicroelectronics |
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20 / 30 page ![]() Some considerations on VTH and TVTC equations and real examples AN2386 20/30 When the gate concentration doping increases from 1e+20cm-3 to 1e+21cm-3 the threshold voltage decreases its value, while, TVTC increases in absolute value and vice versa, decreasing the gate concentration doping from 1e+20cm-3 to 1e+19cm-3. Now, the thermal behavior increasing and decreasing the substrate doping concentration is simulated (see Figure 13. and Figure 14.). Figure 13. DEVICE1 VTH simulated data - comparison between different Na Figure 14. DEVICE1 TVTC simulated data - comparison between different Na When the substrate concentration doping increases from 2e+17cm-3 to 5e+17cm-3 the threshold voltage increases its value and also TVTC increases in absolute value and vice versa, decreasing the substrate concentration doping from 2e+17cm-3 to 5e+16cm-3. Now, the case of different thickness oxide will be studied (see Figure 15. and Figure 16.). Figure 15. DEVICE1 VTH simulated data - comparison between different tox |
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